JPS60236229A - 位置合せ方法 - Google Patents
位置合せ方法Info
- Publication number
- JPS60236229A JPS60236229A JP59091740A JP9174084A JPS60236229A JP S60236229 A JPS60236229 A JP S60236229A JP 59091740 A JP59091740 A JP 59091740A JP 9174084 A JP9174084 A JP 9174084A JP S60236229 A JPS60236229 A JP S60236229A
- Authority
- JP
- Japan
- Prior art keywords
- mark
- reference mark
- wafer
- alignment
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59091740A JPS60236229A (ja) | 1984-05-10 | 1984-05-10 | 位置合せ方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59091740A JPS60236229A (ja) | 1984-05-10 | 1984-05-10 | 位置合せ方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60236229A true JPS60236229A (ja) | 1985-11-25 |
JPH0362013B2 JPH0362013B2 (en]) | 1991-09-24 |
Family
ID=14034914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59091740A Granted JPS60236229A (ja) | 1984-05-10 | 1984-05-10 | 位置合せ方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60236229A (en]) |
-
1984
- 1984-05-10 JP JP59091740A patent/JPS60236229A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0362013B2 (en]) | 1991-09-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100266729B1 (ko) | 면위치검출방법 및 동방법을 사용하는 스캔노광방법 | |
JP3200874B2 (ja) | 投影露光装置 | |
JP2734004B2 (ja) | 位置合わせ装置 | |
KR100389976B1 (ko) | 얼라인먼트방법및장치 | |
US4232969A (en) | Projection optical system for aligning an image on a surface | |
KR100317100B1 (ko) | 마스크 | |
JPS6127682B2 (en]) | ||
US4792693A (en) | Step-and-repeat exposure method | |
JPS61174717A (ja) | 位置合わせ装置 | |
US5640243A (en) | Position detection method | |
JPH0743245B2 (ja) | アライメント装置 | |
JPH051610B2 (en]) | ||
JPH0258766B2 (en]) | ||
JP3203676B2 (ja) | 投影露光装置 | |
JP2005197483A (ja) | 撮像手段の回転誤差計測方法、及びこの回転誤差計測方法を用いた調整方法又は計測方法、及びこの回転誤差計測方法で計測された回転誤差を使用する位置計測装置、及びこの位置計測装置を備えた露光装置 | |
JPS60236229A (ja) | 位置合せ方法 | |
JPH09246168A (ja) | 走査型露光装置および方法ならびに該装置を用いてデバイスを製造する方法 | |
JPS63107139A (ja) | 感光基板のアライメント方法 | |
JPH03232215A (ja) | 位置合せ方法 | |
JP3237022B2 (ja) | 投影露光装置 | |
JP3209189B2 (ja) | 露光装置及び方法 | |
JPH09320920A (ja) | 露光装置の調整方法 | |
JPH0793251B2 (ja) | 投影光学装置 | |
JPS63150916A (ja) | アライメント方法及びアライメント装置の校正用基板 | |
JPS6169127A (ja) | 投影露光装置の基準距離補正方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |